专利名称:Methods and systems for generating a two-dimensional map of a characteristic atrelative or absolute locations of
measurement spots on a specimen duringpolishing
发明人:Kurt Lehman,Charles Chen,Ronald L.
Allen,Robert Shinagawa,Anantha
Sethuraman,Christopher F. Bevis,ThanassisTrikas,Haiguang Chen,Ching Ling Meng
申请号:US10358106申请日:20030204
公开号:US20030181132A1公开日:20030925
专利附图:
摘要:Methods and systems for generating a two-dimensional map of a characteristicat relative or absolute locations of measurement spots on a specimen during polishingare provided. One method includes scanning a specimen with a measurement deviceduring polishing to generate output signals at measurement spots on the specimen. Themethod may also include determining a characteristic of polishing at the measurementspots from the output signals. In addition, the method may include determining relativeor absolute locations of the measurement spots on the specimen. The method mayfurther include generating a two-dimensional map of the characteristic at the relative orabsolute locations of the measurement spots on the specimen. In some embodiments,the relative locations of the measurement spots may be determined from a
representative scan path of the measurement device and an average spacing betweenstarting points on individual scans.
申请人:LEHMAN KURT,CHEN CHARLES,ALLEN RONALD L.,SHINAGAWA
ROBERT,SETHURAMAN ANANTHA,BEVIS CHRISTOPHER F.,TRIKAS THANASSIS,CHENHAIGUANG,MENG CHING LING
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